Nanotronics Wafer Inspection System
A fully automated, optical inspection system for analyzing opaque, transparent, and semi-transparent wafers for defects. nSPEC® offers fast quantification and qualification of defects with detailed reporting and mapping. nSPEC® can image and analyze substrate and epi wafers as well as patterned and diced wafers and even individual devices. The system has multiple magnifications to fully characterize defect frequency and type and offers complete rapid scanning and mosaicing of wafers. Users can easily define reports and statistical functions.
We use only the highest quality optics from the market leaders in microscopy. We add on lighting and high-resolution cameras (megapixels and spatial resolution) for image capture and analysis. You can choose wavelengths and select light paths to optimize resolution and imaging requirements. You can automate the stage, turret and illuminator and F-stop for rapid and accurate scanning.
You can add an optional AFM tip that attaches directly to the turret. With an X/Y resolution of 1.7 nm and a Z resolution of 0.34nm, high resolution probing of sub nm features are a reality. You can obtain feature length and height and depth and surface roughness data.
We’ve engineered easy-to-use software to control all aspects of measurement. Controls include focus, specimen movement, lighting, and objective (magnification) selection. We can also automate color wheels, if you need color but a color camera does not offer the spatial resolution needed, polarizer’s and DIC.